Adaptive wafer modulator for placing a selected pattern on a sem

Details Adaptive wafer modulator for placing a selected pattern on a sem Adaptive wafer modulator for placing a selected pattern on a sem

1994-11-30

1996-10-08

Grimley, Arthur T.

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

355 53, 355 55, 355 47, G03B 2758, G03B 2742

Patent

active

055636845

ABSTRACT:
An adaptive wafer modulator in a photolithography device is described. A focal pattern of a lithographic system is calibrated. Prior to exposing a wafer surface to a selected image pattern, the wafer surface is elastically bent or modulated by actuating a set of adjustable pins supporting the wafer so that the wafer surface being exposed conforms more closely to the calibrated focal pattern of the lithographic system than to the presumed flat focal plane of the lithographic system.

REFERENCES:
patent: 4093378 (1978-06-01), Horr et al.
patent: 4298273 (1981-11-01), Nishizuka et al.
patent: 4425038 (1984-01-01), La Fiandra et al.
patent: 4666291 (1987-05-01), Taniguchi et al.
patent: 5331369 (1994-07-01), Terasawa et al.
patent: 5359389 (1994-10-01), Isohata
patent: 5448332 (1995-09-01), Sakakibara et al.

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