Active spectral control of DUV light source

Coherent light generators – Particular component circuitry – Having feedback circuitry

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S029020, C372S038070, C372S055000, C372S057000, C372S102000

Reexamination Certificate

active

07852889

ABSTRACT:
According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.

REFERENCES:
patent: 4823354 (1989-04-01), Znotins et al.
patent: 4881231 (1989-11-01), Jain
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6490308 (2002-12-01), Albrecht et al.
patent: 6493374 (2002-12-01), Fomenkov et al.
patent: 6721340 (2004-04-01), Fomenkov et al.
patent: 6856638 (2005-02-01), Aab et al.
patent: 2002/0048288 (2002-04-01), Kroyan et al.
patent: 2002/0154668 (2002-10-01), Knowles et al.
patent: 2003/0118072 (2003-06-01), Wittak et al.
patent: 2003/0161373 (2003-08-01), Kitatochi et al.
patent: 2004/0057489 (2004-03-01), Fallon et al.
patent: 2005/0094698 (2005-05-01), Besaucele et al.
patent: 2005/0185690 (2005-08-01), Rule et al.
patent: 2006/0114956 (2006-06-01), Sandstrom et al.
patent: 2006/0114958 (2006-06-01), Trintchouk et al.
patent: 2006/0146900 (2006-07-01), Jacques et al.
patent: 2007/0001127 (2007-01-01), Reiley et al.
patent: 2007/0013913 (2007-01-01), Rafac
patent: WO 01/28048 (2001-04-01), None
U.S. Appl. No. 60/774,770, filed Feb. 17, 2006, Dunstan et al.
Huggins, et al, “Effects Of Laser Bandwidth On OPE In A Modem Lithography Tool,”Optical MicrolithographyXIX, Donis G. Flagello, Editor, Proc., Of SPIE vol. 6154 6154Z (2006).
Ishihara, et al, “ XLA-200: The Third-Generation ArF MOPA Light Source For Immersion Lithography”,Optical Microlithography XVIII, Bruce W. Smith, Editor, Proceedings of SPIE, vol. 5754, pp. 773-779 (2005).
Rafac, et al, “Overcoming Limitations Of Etalon Spectrometers Used For Spectral Metrology of DUV Excimer Light Sources”,Optical Microlithography XVIII, Bruce W. Smith, Editor, Proceedings of SPIE, vol. 5377, pp. 846-858 ( 2004).
European Search Report dated Jun. 7, 2009, EP Patent Application No. 07716893.8 filed Jan. 22, 2007 (7 pages).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Active spectral control of DUV light source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Active spectral control of DUV light source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Active spectral control of DUV light source will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4210321

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.