Active pixel sensor cell that minimizes leakage current

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257 59, 257222, 257232, 257233, 257290, 257291, 257292, 257446, H01L 2904, H01L 27148, H01L 31062, H01L 3100

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active

057897743

ABSTRACT:
The leakage current at the silicon-to-silicon dioxide interfaces of an active pixel sensor cell is substantially reduced by eliminating field oxide from the cell, and by insuring that, during integration, every surface region of the cell that is not heavily doped is either biased into accumulation or biased into inversion. Each of these states, in turn, substantially limits the number of electrons from thermally-generated electron-hole pairs at the surface that can contribute to the leakage current.

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Mendis, S. et al., "Progress in CMOS Active Pixel Image Sensors," SPIE vol. 2172, (1994) Center for Space Microelectronics Tech., Jet Propulsion Laboratory, California Institute of Technology, pp. 19-29, paper presented at a Conference on Feb. 7-8, 1994 in San Jose, CA.
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