Active faceted mirror system for lithography

Details Active faceted mirror system for lithography Active faceted mirror system for lithography

2006-11-14

2006-11-14

Robinson, Mark A. (Department: 2872)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S291000, C359S223100, C359S224200

Reexamination Certificate

active

07136214

ABSTRACT:
An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.

REFERENCES:
patent: 4100576 (1978-07-01), Ditthardt
patent: 4959531 (1990-09-01), Marino
patent: 5339346 (1994-08-01), White
patent: 5469302 (1995-11-01), Lim
patent: 5512759 (1996-04-01), Sweatt
patent: 5631721 (1997-05-01), Stanton et al.
patent: 5677939 (1997-10-01), Oshino
patent: 5828485 (1998-10-01), Hewlett
patent: 6195201 (2001-02-01), Koch et al.
patent: 6220561 (2001-04-01), Garcia
patent: 6600591 (2003-07-01), Anderson et al.
patent: 6658084 (2003-12-01), Singer
patent: 6735008 (2004-05-01), Brophy et al.
patent: 6738177 (2004-05-01), Gutierrez et al.
patent: 2002/0109903 (2002-08-01), Kaeriyama
patent: 2003/0223677 (2003-12-01), Wendland, Jr.
patent: 2003/0227603 (2003-12-01), Dierichs

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