Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-07-19
2005-07-19
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S907000, C430S914000, C526S246000, C549S417000, C549S423000
Reexamination Certificate
active
06919160
ABSTRACT:
Disclosed herein is an acrylic compound that can be polymerized by itself or with at least one other ethylenically unsaturated monomer to provide a polymer. The polymer may be used, for example, within a sub-200 nm photoresist composition. Also disclosed is a method to make the acrylic compound of the present invention from the raw material trifluoroacetone.
REFERENCES:
patent: 6291130 (2001-09-01), Kodama et al.
patent: 6406828 (2002-06-01), Szmanda et al.
patent: 2002/0004570 (2002-01-01), Zampini et al.
patent: 2002/0051936 (2002-05-01), Harada et al.
patent: 2002/0055060 (2002-05-01), Taylor et al.
patent: 2002/0061464 (2002-05-01), Aoai et al.
patent: 1103856 (2001-05-01), None
patent: 1126322 (2001-08-01), None
patent: WO 0017712 (2000-03-01), None
patent: WO 0067072 (2000-11-01), None
patent: WO 0163362 (2001-08-01), None
patent: WO 0185811 (2001-11-01), None
patent: WO 0221212 (2002-03-01), None
patent: WO 0221213 (2002-03-01), None
patent: WO 0221214 (2002-03-01), None
patent: WO 0221216 (2002-03-01), None
M. M. Dhingra, et al. “Polymerization of 1,1,1 Trifluoroacetone with Aliphatic Secondary Amines. A Proton and Fluorine Magnetic Resonance Invesitgation,”Organic Magnetic Resonance, vol. 9, No. 1 (1977), pp. 23-28.
H. E. Simmons, et al., “Fluoroketones” The Central Research Department Station, E. I. du Pont de Nemours and Co., vol. 82 (1959), pp. 2288-2296.
E. T. McBee, et al., “The Chemistry of 1,1,1-Trifluoropropanone. II. The Reactions of 4-Methyl-1,1,1,-5,5,5-hexafluoro-3-penten-2-one with Methyimagnesium Iodide,” The Department of Chemistry, Purdue University (1956), pp. 4597-4598.
A. L. Henne, et al., “Trifluoromethylated Butadienes,” The Department of Chemistry at The Ohio State University (1954), pp. 5147-5148.
K. J. Pryzbilla, et al., “Mexafluoroacetone in Resist Chemistry: A Versatile New Concept for Materials for Deep UV Lithography,” SPIE Advances in Resist Chemistry and Process IX vol. 1672 (1992).
M. K. Crawford, et al., “New Materials for 157 mn Photoresists: Characterization and Properties,” SPIE Advances in Resist Chemistry and Processing IX vol. 3999 (2000).
R. R. Dammel, et al., “New Resin Systems for 157 nm Lithography,” Journal of Photopolymer Science and Technology, vol. 14 No. 4 (2001).
H. Ito, et al., “Development of 157 nm Positive Resists,” J. Vac. Sci. Technol. B 19(6) (2001).
H. Ito, “Dissolution Behavior of Chemically Amplified Resist Polymers for 248-, 193-, and 157-nm Lithography,” J. Res. & Dev. vol. 45 No. 5 (2001).
S. Cho, et al., “Investigation of a Fluorinated ESCAP based resist for 157 nm Lithography,” (2001).
K. Patterson, et al., “The Challenges in Materials Design for 157 nm Photoresists,” Lithography, Solid State Technology, pp. 41-48 (2000).
Abdourazak Atteye Houssein
Markley Thomas John
Air Products and Chemicals Inc.
Morris-Oskanian R. P.
Schilling Richard L.
LandOfFree
Acrylic compounds for sub-200 nm photoresist compositions... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Acrylic compounds for sub-200 nm photoresist compositions..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acrylic compounds for sub-200 nm photoresist compositions... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3423228