Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-01-11
1997-09-09
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430311, 528137, 528482, 210683, 210685, G03F 7004, C08F 600, C02F 142
Patent
active
056655177
ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and a very low level of metal ions, utilizing a solid acid condensation catalyst. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
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Aubin Daniel P.
Durham Dana L.
Kokinda Elaine G.
Rahman M. Dalil
Chu John S.
Hoechst Celanese Corporation
Sayko Jr. Andrew F.
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