Acid-substituted ternary acetal polymers useful in photosensitiv

Details Acid-substituted ternary acetal polymers useful in photosensitiv Acid-substituted ternary acetal polymers useful in photosensitiv

1991-07-30

1992-12-08

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525 60, C08F 800

Patent

active

051698986

ABSTRACT:
Novel acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group. The acid-substituted ternary acetal polymers are advantageously employed in photosensitive compositions in which they are utilized in combination with diazo resins. Such photosensitive compositions are especially well adapted for use in lithographic printing plates which can be developed with aqueous developing solutions.

REFERENCES:
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patent: 4652604 (1987-03-01), Walls et al.
patent: 4741985 (1988-05-01), Aoai et al.
patent: 4940646 (1990-07-01), Pawlowski
patent: 4968745 (1990-11-01), Misra et al.

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