Acid soluble photo-resist comprising a photosensitive polymer

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430281, 522151, 525279, 5253271, 525 59, 526259, 526263, 526265, G03F 7038, C08F 844, G03C 172

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053344855

ABSTRACT:
Photosensitive, photocurable, compositions contain a polymeric backbone which are basic in an aqueous environment having a pendant photosensitive group. The pendant groups are styryl-amine or nitrogen heterocyclic groups which contain an ethylenically unsaturated photocross-linking group. The pendant styryl-amine or nitrogen heterocyclic groups can cross-link two polymer chains by photo addition through ethylenically unsaturated groups in the styryl moiety forming a cyclobutane crosslinked site. The cross-linking is accomplished by irradiating the material with visible light or ultraviolet radiation of appropriate wave length, depending on the absorbitivity of the system. The photocurable polymer can be formulated into useful systems including in liquid resists, pre-coated film resists, etc. and can be used in both negative or positive imaging systems.

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