Acid paint remover

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product

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Details

430309, 430325, 430329, 252143, G03C 500

Patent

active

H00012998

ABSTRACT:
Disclosed is an aqueous acidic developing solution for a photoresist comprising an acid having from about 1 to 8 carbon atoms, in an effective combination with a solubilizing solvent for the photoresist.

REFERENCES:
patent: 3669660 (1972-06-01), Golda et al.
patent: 3886099 (1975-05-01), Hall
patent: 4271261 (1981-06-01), Shimizu et al.
patent: 4587030 (1986-05-01), Casey

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