Acid labile photoactive composition

Details Acid labile photoactive composition Acid labile photoactive composition

1998-02-20

1999-06-29

Reamer, James H.

Organic compounds -- part of the class 532-570 series

Organic compounds

Azo

C07C24510

Patent

active

059170247

ABSTRACT:
A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.

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patent: 5641604 (1997-06-01), Sinta et al.
patent: 5648194 (1997-07-01), Pai et al.
Zahn et al, Chem. Abstracts, vol. 108, No. 177236f, 1988.

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