Acid labile dissolution inhibitors and positive- and negative-ac

Details Acid labile dissolution inhibitors and positive- and negative-ac Acid labile dissolution inhibitors and positive- and negative-ac

1991-09-09

1993-05-11

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430176, 430192, 430325, 430326, 430905, G03C 1492

Patent

active

052100030

ABSTRACT:
Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy,

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Polym. Mat. Sci. Eng. 61(1989), pp. 417-421, N. Hayashi et al. "Tetradropyranyl & Tetrahydrofuranol Protected Hydroxy Stryenes in Chemical Modification Resist Systems for KrF Excimer Laser Lithography".
Chem. Abstr., V. G. Kozyrev et al. vol. 13, No. 19, Nov. 9, 1970, pp. 356-357, 98,735Y.

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