Acid-hardening photoresists comprising a purified hexamethoxy me

Details Acid-hardening photoresists comprising a purified hexamethoxy me Acid-hardening photoresists comprising a purified hexamethoxy me

1992-08-27

1994-12-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430168, 430169, 430191, 430192, 430325, 430330, 430905, G03F 7004, G03F 740

Patent

active

053765044

ABSTRACT:
Photoresists are disclosed that display increased sensitivity, measured as lithographic potential, when compared to known photoresists that contain melamine resin as a crosslinker. The melamine resin in these photoresists contains a higher percent by weight of monomeric hexamethoxymethylmelamine than in known resists.

REFERENCES:
patent: 3322762 (1967-05-01), Erikson et al.
patent: 3744904 (1973-07-01), Loprest et al.
patent: 4149888 (1979-04-01), Loprest
patent: 4181526 (1980-01-01), Blakey et al.
patent: 4341859 (1982-07-01), Keane et al.
patent: 4478932 (1984-10-01), Keane et al.
patent: 4518676 (1988-05-01), Irving
patent: 4734444 (1988-03-01), Henne et al.
patent: 4801508 (1989-01-01), Lutz et al.
patent: 4875124 (1989-10-01), Dickstein et al.
patent: 5034304 (1991-07-01), Feely
patent: 5129681 (1978-12-01), Anderson et al.

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