Acid generators, sulfonic acids, sulfonyl halides, and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S325000, C430S326000, C430S905000, C430S910000, C430S914000, C430S921000, C430S925000, C568S035000, C568S028000, C568S029000, C568S030000, C568S031000, C568S034000, C568S036000, C568S037000, C562S100000, C562S828000, C562S832000, C562S833000, C562S834000

Reexamination Certificate

active

08043786

ABSTRACT:
The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I),wherein R1is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R2to R4are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

REFERENCES:
patent: 7108955 (2006-09-01), Iwasawa et al.
patent: 7288359 (2007-10-01), Iwasawa et al.
patent: 1270553 (2003-01-01), None
patent: 2003-337416 (2003-11-01), None
patent: WO 02/090423 (2002-11-01), None
Derwent English abstract for JP 2003-337416.
Machine-assisted English translation for JP 2003-337416 as provided by JPO.
Derwent Publication Ltd., London, GB; XP002383267 & JP 2000 327654 A (JSR Corp), Abstract (2000).
Advances in Polymer Science, vol. 62, pp. 1-48 (1984).
Inorganic Chemistry, vol. 32, pp. 5007-5010 (1993).
J Photopolym. Sci. Tech., pp. 571-576 (1998).
J. Vac. Sci. Technol. B16(1), pp. 69-76, (1998).
Proc. SPIELvol. 3333, pp. 313-323 (1998).
Proc. SPIELvol. 3333, pp. 634-642 (1998).

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