Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reissue Patent
2004-03-24
2009-06-09
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S286100, C430S176000, C430S197000, C430S192000, C526S262000, C526S281000, C526S279000, C526S284000
Reissue Patent
active
RE040728
ABSTRACT:
The invention is a curable cyclobutarene based polymer comprising acid functional pendant groups. The cured polymer displays excellent qualities of toughness, adhesion, dielectric constant, and low stress. The preferred system is soluble in an aqueous base and can be used to generate patterned films with excellent resolution without the need to handle organic developer solvents.
REFERENCES:
patent: 4540763 (1985-09-01), Kirchhoff
patent: 4638078 (1987-01-01), Kirchhoff
patent: 4724260 (1988-02-01), Kirchhoff et al.
patent: 4783514 (1988-11-01), Kirchhoff et al.
patent: 4812588 (1989-03-01), Schrock
patent: 4826997 (1989-05-01), Kirchhoff
patent: 4996288 (1991-02-01), Bruza
patent: 4999499 (1991-03-01), Bhatt
patent: 5034485 (1991-07-01), Tong et al.
patent: 5136069 (1992-08-01), DeVries et al.
patent: 5138081 (1992-08-01), DeVries et al.
patent: 5185391 (1993-02-01), Stokich, Jr.
patent: 5243068 (1993-09-01), DeVries et al.
patent: 5277536 (1994-01-01), Baldwin et al.
patent: 5349111 (1994-09-01), Scheck
patent: 5391650 (1995-02-01), Brennan et al.
patent: 5585450 (1996-12-01), Oaks et al.
patent: 0 527 572 (1993-02-01), None
patent: 04-136056 (1992-05-01), None
patent: 09-219586 (1997-08-01), None
patent: WO 94/25903 (1994-11-01), None
Farona, Michael F., Prog. Polym. Sci., “Benzocyclobutenes in Polymer Chemistry,” vol. 21, pp. 505-555 (1996).
Hahn, et al., Macromolecules, Thermal Polymerization of Bis(benzocyclobutene) Monomers Containing .alpha., beta.-Disubstituted Ethenes, vol. 26, pp. 3870-3877, (1993).
Ito, et al., Macromolecules, “Thermal and Acid-Catalyzed Deesterification and Rearrangement of Poly(2-cyclopropl-2-proply 4-vinylbenzoate) and Their Application to Lithographic Imaging,” vol. 23, pp. 2589-2598, (1990).
Kirchoff, et al., Prog. Polym. Sci., “Benzocyclobutenes in Polymer Synthesis,” vol. 18, pp. 85-185, (1993).
Kometani, et al., Macromolecules, “A Novel Approach to Inducing Aqueous Base Solubility in Substituted Styrene-Sulfone Polymers,” vol. 26, pp. 2165-2170, (1993).
Marks, et al. The Polymeric Materials Encyclopedia, Salamone, ed., “BCB Homopolymerization Chemistry and Applications,” CRC Press, pp. 461-469, Jun. 1996.
Moyers, et al., Negative Tone Photodefinable Benzocyclobutene Formulations For Thin Film Microelectronic Applications, Proceedings of 10.sup.th International Conference on Photopolymers, Oct.-Nov. 1994.
Organic Chemistry, Morrison and Boyd, Allyn and Bacon, NY, 3.sup.rd Ed., pp. 675-681, 1975.
Photoreactive Polymers: Wiley-Interscience Publication, pp. 102-127, 187 and 216, 1989.
Photosensitive Polymides; Technomic Publishing Company, Inc., pp. 248-272, 1995.
Skinner, et al., Dissolution Properties of Photobenzocyclobutene Films, Proceedings of the 10.sup.th International Conference on Photopolymers, Oct.-Nov. 1994.
Wallraff, J. Vac. Sci. Tech., “Thermal and acid catalyzed deprotection kinetics in candiadate deep ultraviolet resist materials,” B 12(6), pp. 3857-3862, (Nov./Dec. 1994).
English Translation of Patent Application Kokai No H9-219586, Japanese Patent Office, 25 pages submitted by applicant in U.S. Appl. No. 09/177,819.
English Translation of Patent Application Kokai No H4-136856, Japanese Patent Office, 19 pages submitted by applicant in U.S. Appl. No. 09/177,819.
DeCaire Richard P.
DeVries Robert A.
Dibbs Mitchell G.
McGee Robert L.
Radler Michael J.
Dow Global Technologies Inc.
Hamilton Cynthia
LandOfFree
Acid functional polymers based on benzocyclobutene does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Acid functional polymers based on benzocyclobutene, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acid functional polymers based on benzocyclobutene will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4072642