Acid-degradable resin compositions containing...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C522S162000, C522S059000, C522S031000, C522S057000

Reexamination Certificate

active

07105272

ABSTRACT:
It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I):wherein R1and R2independently represent hydrogen atom, halogen atom, C1-20hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(═O)R4group, S(O)nR4group, P(═O)(R4)2group or M(R4)3group; R3represents C1-20hydrocarbon group or a heterocyclic group: R4represents C1-20hydrocarbonoxy group, C1-20hydrocarbon group, C1-20hydrocarbonthio group or mono- or di-C1-20hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.

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