Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-07-05
1981-02-03
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415924, 204158R, 430281, 430286, 430306, 430329, G03C 168, G03C 500
Patent
active
042489571
ABSTRACT:
This invention relates to an improvement in a radiation-sensitive mixture containing (a) a compound which forms an acid under the influence of actinic radiation and (b) a compound which has at least one acid-cleavable C--O--C group and the solubility of which in a liquid developer is increased by the action of an acid, the improvement that the compound which is capable of being cleft by an acid contains at least one enol ether group as the acid-cleavable group. The invention also relates to a process for producing relief images using the radiation-sensitive mixture.
REFERENCES:
patent: 2891712 (1959-06-01), Plambeck
patent: 3779778 (1973-12-01), Smith et al.
patent: 3915704 (1975-10-01), Limburg et al.
patent: 3915706 (1975-10-01), Limburg et al.
patent: 3917483 (1975-11-01), Limburg et al.
patent: 3932514 (1976-01-01), Thelen et al.
Buhr Gerhard
Lohaus Gerhard
Sander Jurgen
Skaletz Detlef
Brammer Jack P.
Bryan James E.
Hoechst Aktiengesellschaft
LandOfFree
Acid degradable radiation-sensitive mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Acid degradable radiation-sensitive mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acid degradable radiation-sensitive mixture will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-551456