Acid-cleavable radiation-sensitive compounds, radiation-sensitiv

Details Acid-cleavable radiation-sensitive compounds, radiation-sensitiv Acid-cleavable radiation-sensitive compounds, radiation-sensitiv

1992-04-20

1994-09-13

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430176, 430270, 430286, 430292, 430300, 430302, 430323, 430326, 430914, 430919, 430925, G03C 173, G03C 1725, G03F 7025, G03F 7027

Patent

active

053468066

ABSTRACT:
Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical,

REFERENCES:
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4247611 (1981-01-01), Sander et al.
patent: 4883740 (1989-11-01), Schwalm et al.
Reichmanis et al., "Chemistry and Processes for Deep-UV Resists," Microelectronic Engineering, vol. 13, pp. 3-10 (Mar. 1991).
Schlegel et al., "Highly Sensitive Positive Deep UV Resist Utilizing a Sulfonate Acid Generator and a Tetrahydropyranyl Inhibitor," Microelectronic Engineering, vol. 13, pp. 33-36 (Mar. 1991).
CA 116(24):245275k, "Positive Working Radiation Sensitive Composition and Radiation-Sensitive Recording Material for Exposure Using UV-Radiation," Roeschert et al, Jun. 15, 1992.
C. Wilson, et al, "Introduction to Microlithography, Organic Resist Materials-Theory and Chemistry", ACS Symposium Series 219, 87, Mar. 20-25, 1983, pp. 88-159.
C. Petropoulos, "Synthesis of Novel Photodegradable Poly(o-Nitrobenzaldehyde Acetal) Polymers", J. Polym. Sci., Polym. Chem. Ed., 15, 1977, pp. 1637-1644.
F. M. Houlihan, et al, "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists", SPIE, vol. 920, 1988, pp. 67-74.

Affiliated with

Also associated with

Rating

Acid-cleavable radiation-sensitive compounds, radiation-sensitiv does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Acid-cleavable radiation-sensitive compounds, radiation-sensitiv, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acid-cleavable radiation-sensitive compounds, radiation-sensitiv will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1119686