Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-08-16
1986-11-04
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430272, 430311, 430316, 430330, 427 82, 427379, G03C 176, B05D 302
Patent
active
046210423
ABSTRACT:
The use of o-cresol novolac resin for planarizing large topographic features on a semiconductor substrate is disclosed. In addition to being a superior planarizing material, o-cresol novolac resin oxidizes and darkens upon baking to provide excellent absorption capability for the light wavelengths which are conventionally utilized to irradiate photoresist compositions. O-cresol novolac resin additionally transmits light at higher wavelengths which are used to align pattern masks with alignment keys on a substrate. These properties further make a transparent substrate coated with a patterned layer of o-cresol novolac resin useful as a lithographic mask.
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Di Piazza James J.
Pampalone Thomas R.
Dees Jos,e G.
Kittle John E.
Morris B. E.
RCA Corporation
Swope R. H.
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