Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-06-05
1986-10-21
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430311, 430325, 430519, 430313, 430323, 430326, 430327, 430510, 430512, 430517, 430166, 156643, G03C 516, G03C 184, G03C 176
Patent
active
046185658
ABSTRACT:
Multilayer photoresist recording media containing an absorptive layer are improved by forming the absorptive layer from a composition comprising PMMA or a copolymer of methylmethacrylate and methacrylic acid, certain dyes such as hydroxyazobenzoic acid or Sudan Orange G and a suitable solvent. The dyes are insoluble in the solvent of an overlying photoresist layer. The media are substantially free of loss of resolution due to dissolution of the dye into the photoresist layer.
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Ong and Hu, "Multilayer Resists for Fine Line Optical Lithography", Solid State Technology, Jun. 1984, pp. 155-160.
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Levine Aaron W.
Miszkowski Nancy A.
White Lawrence K.
Hamilton Cynthia
Kittle John E.
Morris B. E.
RCA Corporation
Swope R. H.
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