Ablatively photodecomposable compositions

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430313, 430331, 430270, 430905, G03C 516, G03F 7039

Patent

active

057562598

ABSTRACT:
The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

REFERENCES:
patent: Re28789 (1976-04-01), Chan
patent: 3867318 (1975-02-01), Nishikubo et al.
patent: 3985566 (1976-10-01), Buhr et al.
patent: 4720470 (1988-01-01), Johnson
patent: 4839261 (1989-06-01), Nakazaki et al.
patent: 4861425 (1989-08-01), Greer et al.
patent: 4877853 (1989-10-01), Siol et al.
patent: 4902610 (1990-02-01), Shipley
patent: 4913836 (1990-04-01), East
patent: 4957655 (1990-09-01), Khanarian et al.
patent: 4975223 (1990-12-01), Doi et al.
patent: 4978476 (1990-12-01), Allen et al.
patent: 5002361 (1991-03-01), DeMartino et al.
patent: 5017502 (1991-05-01), Sakama et al.
patent: 5041509 (1991-08-01), Lee et al.
patent: 5043251 (1991-08-01), Sonnenschein et al.
patent: 5130227 (1992-07-01), Wade et al.
patent: 5133898 (1992-07-01), Fock et al.
patent: 5137618 (1992-08-01), Burnett et al.
patent: 5153103 (1992-10-01), Kotachi et al.
patent: 5178961 (1993-01-01), Faust et al.
patent: 5178963 (1993-01-01), Faust et al.
patent: 5186865 (1993-02-01), Wu et al.
patent: 5196376 (1993-03-01), Reche
patent: 5207952 (1993-05-01), Griffin, III
patent: 5231140 (1993-07-01), Kilburg et al.
patent: 5246817 (1993-09-01), Shipley et al.
patent: 5262244 (1993-11-01), Faust et al.
patent: 5384221 (1995-01-01), Savant et al.
patent: 5401618 (1995-03-01), Chapman et al.
patent: 5460921 (1995-10-01), Cywar et al.
Swalen, et al., Chemical Abstracts, vol. 118, Abstract No. 243979.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ablatively photodecomposable compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ablatively photodecomposable compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ablatively photodecomposable compositions will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1958632

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.