Ablatively photodecomposable compositions

Details Ablatively photodecomposable compositions Ablatively photodecomposable compositions

1997-01-14

1999-05-11

Yoon, Tae

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

4302811, 430910, 428901, G03C1/805;1/76

Patent

active

059027126

ABSTRACT:
The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

REFERENCES:
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patent: 5286803 (1994-02-01), Lindsay et al.
patent: 5298583 (1994-03-01), Heiliger et al.
patent: 5354633 (1994-10-01), Lewis et al.
patent: 5460921 (1995-10-01), Cywar et al.

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