Ablative imaging by proximity lithography

Details Ablative imaging by proximity lithography Ablative imaging by proximity lithography

1995-01-31

1996-03-26

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430201, 4302731, 430322, 430945, 430964, G03F 722, G03F 500

Patent

active

055019447

ABSTRACT:
The present invention includes a method of creating a shaped image in a workpiece using a high energy source, with the method comprising positioning a layer proximate the workpiece such that the layer prevents debris from the workpiece from dispersing, and directing radiation from the high energy source through the layer to the workpiece, the layer substantially transparent to radiation emitted by the high energy source such that the high energy source is capable of forming the shaped image.

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