Ablating liquefaction employing plasma

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65134, 65135, 65335, 65337, 266213, 432264, C03B 510

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045457980

ABSTRACT:
Converting thermally meltable materials to a liquefied state is carried out by a plasma heat source encircled by a layer of the unmelted material. As liquefied material is drained from the surface, additional unmelted material is fed onto the surface to maintain a substantially constant layer of the unmelted material, thereby maintaining the temperature of the melting vessel relatively low and eliminating the need for forced cooling of the vessel.

REFERENCES:
patent: 296227 (1884-04-01), Schulze-Berge
patent: 682365 (1901-09-01), Mount
patent: 698766 (1902-04-01), Voelker
patent: 708309 (1902-09-01), Bronn
patent: 908151 (1908-12-01), Schwenzfeier
patent: 1082195 (1913-12-01), Helfenstein
patent: 1371084 (1921-03-01), Ferguson
patent: 1577602 (1926-03-01), Amsler
patent: 1621446 (1927-03-01), Watson
patent: 1863708 (1932-06-01), Zotos
patent: 1870636 (1932-08-01), McIntyre et al.
patent: 1877714 (1932-09-01), Bulask
patent: 1889509 (1932-11-01), Amsler
patent: 1889511 (1932-11-01), Amsler
patent: 1928598 (1933-09-01), Morton et al.
patent: 1953023 (1934-03-01), Mulholland
patent: 1999761 (1935-04-01), Howard
patent: 1999762 (1935-04-01), Howard
patent: 2006947 (1935-07-01), Ferguson
patent: 2007755 (1935-07-01), Ferguson
patent: 2074819 (1937-03-01), Weitzenkorn
patent: 2154737 (1939-04-01), Erdmann
patent: 2262070 (1941-11-01), Turk
patent: 2358903 (1944-09-01), Zotos
patent: 2398952 (1946-04-01), Nachod
patent: 2451582 (1948-10-01), Smith
patent: 2455907 (1948-12-01), Slayter
patent: 2593197 (1952-04-01), Rough
patent: 2834157 (1958-05-01), Bowes
patent: 2878004 (1959-03-01), Saeman
patent: 3077094 (1963-02-01), Jack et al.
patent: 3109045 (1963-10-01), Silverman
patent: 3151964 (1964-10-01), North
patent: 3328149 (1967-06-01), Keefer
patent: 3510289 (1970-05-01), Boivent
patent: 3526492 (1970-09-01), Motsch
patent: 3637365 (1972-01-01), Oulton
patent: 3689679 (1972-09-01), Niwa et al.
patent: 3917479 (1975-11-01), Sayce et al.
patent: 3944713 (1976-03-01), Plumat
patent: 4061487 (1977-12-01), Kiyonaga
patent: 4062667 (1977-12-01), Hatanaka et al.
patent: 4110097 (1978-08-01), Chevallier et al.
patent: 4113459 (1978-09-01), Mattmuller
patent: 4138238 (1979-02-01), Strickland
patent: 4185984 (1980-01-01), Kiyonaga
patent: 4188201 (1980-02-01), Jung
patent: 4381934 (1983-05-01), Kunkle et al.
Grosse, A., et al., "The Centrifugal Plasma Jet Furnace," Material Research & Standards, Apr. 1965, pp. 173-177.
Whyman, D., "A Rotating-Wall, D.C.-Arc Plasma Furnace," J. Sci. Instrum., 1967, vol. 44, pp. 525-530.
Selton, B., et al., "The Centrifugal Liquid Wall Furnace," J. Materials Science, vol. 4, 1969, pp. 302-309.
Foex, M., et al., "A Plasma Transferred Arc Heated High Temperature Rotary Furnace," Fifth Symposium on Special Ceramics, Stoke-on-Trent, G.B., 1970, pp. 175-183.
Foex, M., et al., "High Temperature Rotary Furnace for Melting Refractory Materials Heated Along Central Axis by Plasma Torches," International Conference on Gas Discharges, London, 1970, pp. 241-245.
Everest, D., et al., "Preparation of Ultrafine Alumina Powders by Plasma Evaporation," J. Materials Science, vol. 6, 1971, pp. 218-224.
Yerouchalmi, D., "Four Rotatif a Plasma," Electrotherm Company, Brussels, Date Unknown.

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