Aberration measuring method of projection optical system

Details Aberration measuring method of projection optical system Aberration measuring method of projection optical system

2005-01-04

2005-01-04

Font, Frank G. (Department: 2877)

Optics: measuring and testing

Lens or reflective image former testing

C356S125000, C351S211000, C351S221000, C355S055000, C355S052000

Reexamination Certificate

active

06839132

ABSTRACT:
There is disclosed aberration measuring method of a projection optical system comprising collectively irradiating the finite region of the photomask in which a diffraction grating is formed with the illuminating light emitted from secondary light source having point sources, projecting 0th-order and 1st-order diffracted lights to first and second measurement planes conjugated with the secondary light source by using a projection optical system, respectively, the 0th-order and 1st-order diffracted lights being passed through the photomask, measuring a relation of projected positions in the first and second measurement planes between the 0th-order diffracted light and 1st-order diffracted light of the light emitted from one arbitrary point source, respectively, obtaining lay aberration concerning the light emitted from the point source on the basis of the obtained two relations of projected positions.

REFERENCES:
patent: 5424552 (1995-06-01), Tsuji et al.
patent: 5615006 (1997-03-01), Hirukawa et al.
patent: 6130747 (2000-10-01), Nomura et al.
patent: 6248486 (2001-06-01), Dirksen et al.
patent: 6317198 (2001-11-01), Sato et al.
patent: 6674511 (2004-01-01), Nomura et al.
Shannon, R.R. et al., “Applied Optics and Optical Engineering”, Academic Press, Inc., vol. XI, pp. 12-15.

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