Aberration corrector and charged particle beam apparatus...

Details Aberration corrector and charged particle beam apparatus... Aberration corrector and charged particle beam apparatus...

2008-08-07

2010-11-16

Berman, Jack I (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML, C250S492300, C250S311000, C250S310000

Reexamination Certificate

active

07834326

ABSTRACT:
The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage multipole is formed by arranging plural combinations of electrodes around an optical axis using alignment blocks, each combination of electrodes being made by brazing-integrating plural electrodes with a ceramic material interposed therebetween.

REFERENCES:
patent: 5041731 (1991-08-01), Oae et al.
patent: 6946663 (2005-09-01), Kawai
patent: 7211804 (2007-05-01), Yoshida et al.
patent: 2007/0125954 (2007-06-01), Frosien
patent: 2001-312988 (2001-11-01), None
patent: 2004-234961 (2004-08-01), None
patent: 2004-241190 (2004-08-01), None
H. Rose, et al, Optik 22, (1971), pp. 1-24.
Zach, et al, “Aberration Correction in a Low Voltage SEM by a Multipole Corrector”, Nuclear Instruments and Methods in Physics Research A 363 (1995) 316-325.

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