Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate
2007-02-20
2007-02-20
Lauchman, Layla G. (Department: 2877)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
C356S400000, C356S401000
Reexamination Certificate
active
10889803
ABSTRACT:
An aberration mark for use in an optical photolithography system, and a method for estimating overlay errors and optical aberrations. The aberration mark includes an inner polygon pattern and an outer polygon pattern, wherein each of the inner and outer polygon patterns include a center, and two sets of lines and spaces having a different feature size and pitch that surround the outer polygon pattern. The aberration mark can be used to estimate overlay errors and optical aberrations. In some embodiments, the mark can also be used with scatterometry or scanning electron microscope devices. In other embodiments, the mark can be used to monitor aberrations of a lens in an optical photolithography system.
REFERENCES:
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5355306 (1994-10-01), Waldo
patent: 5365072 (1994-11-01), Turner et al.
patent: 5371774 (1994-12-01), Cerrina et al.
patent: 5701013 (1997-12-01), Hsia et al.
patent: 5712707 (1998-01-01), Ausschnitt et al.
patent: 5715063 (1998-02-01), Ota
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5838450 (1998-11-01), McCoy et al.
patent: 5841520 (1998-11-01), Taniguchi
patent: 5939226 (1999-08-01), Tomimatu
patent: 5966201 (1999-10-01), Shiraishi et al.
patent: 5978085 (1999-11-01), Smith et al.
patent: 6011611 (2000-01-01), Nomura et al.
patent: 6097473 (2000-08-01), Ota et al.
patent: 6118185 (2000-09-01), Chen et al.
patent: 6137578 (2000-10-01), Ausschnitt
patent: 6165656 (2000-12-01), Tomimatu
patent: 6172740 (2001-01-01), Suzuki
patent: 6238851 (2001-05-01), Nishi
patent: 6317211 (2001-11-01), Ausschnitt et al.
patent: 6333776 (2001-12-01), Taniguchi
patent: 6356343 (2002-03-01), Shiraishi et al.
patent: 6396569 (2002-05-01), Zheng et al.
patent: 6407396 (2002-06-01), Mih et al.
patent: 6429930 (2002-08-01), Littau et al.
patent: 6432591 (2002-08-01), Baluswamy et al.
patent: 6436595 (2002-08-01), Credendino et al.
patent: 6440612 (2002-08-01), Baggenstoss
patent: 6453457 (2002-09-01), Pierrat et al.
patent: 6465141 (2002-10-01), Boettiger et al.
patent: 6486956 (2002-11-01), Byers et al.
patent: 6498685 (2002-12-01), Johnson
patent: 6523162 (2003-02-01), Agrawal et al.
patent: 6538830 (2003-03-01), Boettiger et al.
patent: 6539521 (2003-03-01), Pierrat
patent: 6545829 (2003-04-01), Boettiger et al.
patent: 6577406 (2003-06-01), Bruce et al.
patent: 6584609 (2003-06-01), Pierrat et al.
patent: 6596448 (2003-07-01), Lai et al.
patent: 6606152 (2003-08-01), Littau et al.
patent: 6617080 (2003-09-01), Kawachi
patent: 6625801 (2003-09-01), Pierrat
patent: 6699627 (2004-03-01), Smith et al.
patent: 6730444 (2004-05-01), Bowes
patent: 6744143 (2004-06-01), Matsufusa et al.
patent: 6822342 (2004-11-01), Baluswamy et al.
patent: 2001/0017693 (2001-08-01), Zheng et al.
patent: 2001/0055103 (2001-12-01), Nishi
patent: 2002/0041369 (2002-04-01), Boettiger et al.
patent: 2002/0041373 (2002-04-01), Littau et al.
patent: 2002/0070355 (2002-06-01), Ota
patent: 2002/0085297 (2002-07-01), Boettiger et al.
patent: 2002/0137237 (2002-09-01), Byers
patent: 2002/0137240 (2002-09-01), Byers et al.
patent: 2002/0137303 (2002-09-01), Byers et al.
patent: 2002/0182516 (2002-12-01), Bowes
patent: 2003/0002031 (2003-01-01), Littau et al.
patent: 2003/0002043 (2003-01-01), Abdulhaim et al.
patent: 2003/0021465 (2003-01-01), Adel et al.
patent: 2003/0021466 (2003-01-01), Adel et al.
patent: 2003/0021467 (2003-01-01), Adel et al.
patent: 2003/0026471 (2003-02-01), Adel et al.
patent: 2003/0035090 (2003-02-01), Imai et al.
patent: 2003/0081193 (2003-05-01), White et al.
patent: 2003/0087192 (2003-05-01), Gau et al.
patent: 2003/0090661 (2003-05-01), Kobayashi
patent: 2003/0095267 (2003-05-01), Mieher et al.
patent: 2003/0117599 (2003-06-01), Takakuwa et al.
patent: 2003/0152851 (2003-08-01), Ideda
patent: 2003/0156276 (2003-08-01), Bowes
Ausschnitt, Christopher P., et al., “Seeing the forest for the trees: a new approach to CD control”,SPIE,3332 , 212-220.
Kim, Young C., “Automatic In-situ Focus Monitor Using Line Shortening Effect”,SPIE, 3677, (1999), 184-193.
Lauchman Layla G.
Micro)n Technology, Inc.
Schwegman Lundberg Woessner & Kluth P.A.
LandOfFree
Abberation mark and method for estimating overlay error and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Abberation mark and method for estimating overlay error and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Abberation mark and method for estimating overlay error and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3857207