3-D single gate inverter

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S335000, C257S338000, C257S341000, C257S350000, C257S351000, C257S357000, C257S371000, C257S401000, C257SE27026, C257SE27027, C257SE27059, C257SE27060, C257SE27062, C257SE27064

Reexamination Certificate

active

07868391

ABSTRACT:
A 3-D (Three Dimensional) inverter having a single gate electrode. The single gate electrode has a first gate dielectric between the gate electrode and a body of a first FET (Field Effect transistor) of a first doping type, the first FET having first source/drain regions in a semiconductor substrate, or in a well in the semiconductor substrate. The single gate electrode has a second gate dielectric between the gate electrode and a body of a second FET of opposite doping to the first FET. Second source/drain regions of the second FET are formed from epitaxial layers grown over the first source/drain regions.

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patent: 2009/0224368 (2009-09-01), Sudo
IBM U.S. Appl. No. 12/416,264, David H. Allen, et al., “Enhanced Field Effect Transistor” filed Apr. 1, 2009.

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