3-D semiconductor die structure with containing feature and...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S108000, C438S612000, C438S614000, C438S652000, C438S660000, C438S661000, C438S674000, C257S737000, C257S738000, C257S778000, C257S779000, C257S780000, C257S797000, C257SE23069, C257SE23179

Reexamination Certificate

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07811932

ABSTRACT:
A die-on-die assembly has a first die (10) and a second die (50). The first die (10) has a first contact extension (28,42) and a peg (32,44,45) extending a first height above the first die. The second die (50) has a second contact extension (68) connected to the first contact extension and has a containing feature (62) extending a second height above the second die surrounding the peg. The peg extends past the containing feature. Because the peg extends past the containing feature, lateral movement between the first and second die can cause the peg to come in contact with and be constrained by the containing feature. The peg and containing feature are thus useful in constraining movement between the first and second die.

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PCT Application No. PCT/US2008/086174 International Search Report and Written Opinion dated Jun. 22, 2009.

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