(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-s

Details (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-s (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-s

1993-03-17

1996-10-08

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430193, 534557, G03F 7023

Patent

active

055630189

ABSTRACT:
The invention relates to 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl- or -isopropylbenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid, a radiation-sensitive mixture prepared therewith, and a radiation-sensitive recording material comprising a substrate and a radiation-sensitive layer which is composed of the mixture according to the invention.

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M unzel et al., "A-and B- Parameter Dependent Submicron Stepper Performance of Positive Tupe Photoresist," Microelectronic Engineering, vol. 6, pp. 421-426 (1987).
Trefonas et al., "New Principle for Image Enhancement in Single Layer Positive Photoresists," SPIE, vol. 771, pp. 194-210 (1987).
Kosar, Light Sensitive Systems: Chemistry and Application of Nonsilver Halide Photographic Processes, (New York: John Wiley & Sons, Inc.), pp. 336-353 (1965).

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