4. Coating apparatus
  5. Gas or vapor deposition
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Crawley John A.

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CreaPhys GmbH

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Crippa Danilo

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Crowell Anna Michelle

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Crumbaker Todd E.

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CS Halbleiter -und Solartechnologie GmbH

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Cui Guang-Ji

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Curran Robert Edward

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Curtin John H.

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Curtis Gary L

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CuTek Research Inc.

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Cuthbert Gordon E.

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CVD Diamond Corporation

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