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US Patents

Method to enhance deuterium anneal/implant to reduce channel-hot

Semiconductor device manufacturing: process – Gettering of substrate – By implanting or irradiating

Patent

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How useful is this invention? - Does humanity need patent for this invention?

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Somewhat useful

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Somehow useless

Completely useless

Rate originality. - plagiarist, copy or a brand new idea

Genial

Original

Not sure

Copied from somewhere

Already used for thousands of years

Is it obsolete or futuristic?

Well ahead of time

Somewhat futuristic

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Somewhat obsolete

Completely obsolete

If you were patent examiner would you approve this patent?

Yes

Most likely

Not sure

Probably not

Definitively not

Does this invention solve a specific problem?

Yes

It might

Not sure

Bloory idea and bloory practical use

Very broad patent, without practical use

What is the true purpose of this patent? - Does this patent serve only to stop other inventors persuing an idea, or it is patented to solve a specific problem?

Patented to preserve knowledge

Defensive patent

I am not sure

Manufacturing base and used to stop/slow down rivals

Serves only patent trolls

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