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US Patents

Method for fine patterning of a polymeric film

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound

Patent

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Already used for thousands of years

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Bloory idea and bloory practical use

Very broad patent, without practical use

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Patented to preserve knowledge

Defensive patent

I am not sure

Manufacturing base and used to stop/slow down rivals

Serves only patent trolls

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