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US Patents

Intermediate layer lithography

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Patent

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Already used for thousands of years

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Bloory idea and bloory practical use

Very broad patent, without practical use

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Patented to preserve knowledge

Defensive patent

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Manufacturing base and used to stop/slow down rivals

Serves only patent trolls

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