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LandOfFree [ US Patents ]

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US Patents

Hard masking method for forming patterned oxygen containing...

Etching a substrate: processes – Etching of semiconductor material to produce an article...

Reissue Patent

[ 0.00 ] – not rated yet Voters 0 Comments 0

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How useful is this invention? - Does humanity need patent for this invention?

Very useful

Somewhat useful

Not sure

Somehow useless

Completely useless

Rate originality. - plagiarist, copy or a brand new idea

Genial

Original

Not sure

Copied from somewhere

Already used for thousands of years

Is it obsolete or futuristic?

Well ahead of time

Somewhat futuristic

Not sure

Somewhat obsolete

Completely obsolete

If you were patent examiner would you approve this patent?

Yes

Most likely

Not sure

Probably not

Definitively not

Does this invention solve a specific problem?

Yes

It might

Not sure

Bloory idea and bloory practical use

Very broad patent, without practical use

What is the true purpose of this patent? - Does this patent serve only to stop other inventors persuing an idea, or it is patented to solve a specific problem?

Patented to preserve knowledge

Defensive patent

I am not sure

Manufacturing base and used to stop/slow down rivals

Serves only patent trolls

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