LandOfFree - US Patents - Listing for Chemistry of inorganic compounds

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Removal of CO.sub.2 from gas mixtures

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

Patent

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Removal of contaminants and recovery of by-products from hot was

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Sulfur or sulfur containing component

Patent

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Removal of contaminants from by-product acids

Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing

Reexamination Certificate

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Removal of contaminants from gas streams in rayon production

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

Reexamination Certificate

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Removal of contaminants from gaseous streams

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Direct contact with molten material

Patent

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Removal of contaminants from zeolite mother liquors

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

Patent

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Removal of degradation product from gas treating solution

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

Patent

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Removal of detrimental metal ions from hydrofluoric acid solutio

Chemistry of inorganic compounds – Halogen or compound thereof – Hydrogen halide

Patent

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Removal of dinitrogen difluoride from nitrogen trifluoride

Chemistry of inorganic compounds – Nitrogen or compound thereof – Binary compound

Patent

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Removal of dissolved actinides from alkaline solutions by the me

Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Radioactive metal

Patent

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Removal of dissolved cadmium and copper from sulphate solution w

Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Group ib metal

Patent

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Removal of dissolved organic matter from acidic aqueous solution

Chemistry of inorganic compounds – Phosphorus or compound thereof – Oxygen containing

Patent

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Removal of ethylene from gases

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Organic component

Patent

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Removal of ethylene from silane using a distillation step after

Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound

Patent

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Removal of fluorine from phosphatic solutions

Chemistry of inorganic compounds – Phosphorus or compound thereof – Oxygen containing

Patent

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Removal of gaseous hydrides

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture

Patent

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Removal of gases from a feed

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture

Reexamination Certificate

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Removal of gases from an enclosed space using metal hydrocarbyl

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

Patent

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Removal of H.sub.2 S and COS

Chemistry of inorganic compounds – Sulfur or compound thereof – Elemental sulfur

Patent

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Removal of H.sub.2 S from gas streams

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

Patent

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