Chemistry of inorganic compounds – Halogen or compound thereof – Hydrogen halide
Patent
1993-06-17
1994-09-20
Lewis, Michael
Chemistry of inorganic compounds
Halogen or compound thereof
Hydrogen halide
423483, 423484, 75726, 156642, C01B 707
Patent
active
053487222
ABSTRACT:
The invention relates to the removal of detrimental metal ions represented by Cu ion from a hydrofluoric acid solution for use in the manufacturing of semiconductor devices to clean silicon wafer surfaces. The acid solution is brought into contact with silicon granules which are used for the adsorption of the detrimental metal ions. To enhance the adsorption power and the rate of adsorption, the silicon granules are treated in advance to deposit a metal which is lower in ionization tendency than silicon on the surface of each silicon granule so as to partly cover the silicon granule surface by the deposited metal. Particularly Au or Ag is suitable as the metal deposited on the silicon granules.
REFERENCES:
patent: 3117000 (1964-01-01), Schlain et al.
patent: 3884692 (1975-05-01), Griffith et al.
patent: 3902896 (1975-09-01), Borbely et al.
patent: 4952386 (1990-08-01), Davison et al.
Shimono Tsugio
Yamamoto Ken-ichi
Lewis Michael
NEC Corporation
Nguyen N. M.
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