4. Semiconductor device manufacturing: process
  5. Coating with electrically or thermally conductive material
  6. To form ohmic contact to semiconductive material

Hiroaki Takikawa

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Anti-reflective coatings for use at 248 nm and 193 nm

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method of preventing resist poisoning in dual damascene...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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Method of preventing resist poisoning in dual damascene...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2725512

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