Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-09-25
2000-04-25
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302811, 4302871, 4302861, 430919, 430195, 430325, 522 10, 522 14, 522 28, 522902, 522 26, G03F 7031, G03F 7038, G03F 730
Patent
active
060542519
ABSTRACT:
The present invention provides a visible laser-curable resist composition which contains at least one radical-protecting compound selected from a phosphorous acid ester compound and an aromatic compound having N,N-dimethylamino group bonded to the carbon atom forming the aromatic ring and which is free from the hindrance of curing caused by deactivation of radical by oxygen and has excellent curability, and a process for formation of a resist pattern using the above composition.
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Registry No. 7478-69-5, Registry File of Americon Chemical Society obtained from STN Database Service, 1998.
Imai Genji
Kogure Hideo
Hamilton Cynthia
Kansai Paint Co. Ltd.
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