System and method for determining a deposition rate in a process

Measuring and testing – Liquid analysis or analysis of the suspension of solids in a... – Content or effect of a constituent of a liquid mixture

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73 6149, 137 2, G01N 3300

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060530324

ABSTRACT:
A system and a method are provided for detecting and monitoring changes in frequency in a process stream. At least one probe is placed in the process stream that is capable of detecting a change in frequency due to a build-up of mass on the probe from scale, corrosion, biofilm or the like in the process stream. A processor receives the signal produced by the probe to produce an output signal indicative of the change in frequency which is proportional to mass detected by the probe. A feeder is capable of feeding a product into the process stream as a result of the detected change in frequency of the probe to combat the mass build-up from scale, corrosion, biofilm or the like in the process stream. The system and method are further capable of measuring anti-scalant, corrosion inhibitor, biocide efficacy and controlling product feed into the process stream based on the determined efficacy.

REFERENCES:
patent: 3715911 (1973-02-01), Chuan
patent: 3863495 (1975-02-01), Schulz et al.
patent: 4547648 (1985-10-01), Longeway
patent: 4788466 (1988-11-01), Paul et al.
patent: 5112642 (1992-05-01), Wajid
patent: 5135852 (1992-08-01), Ebersole et al.
patent: 5201215 (1993-04-01), Granstaff et al.
patent: 5208162 (1993-05-01), Osborne et al.
patent: 5369033 (1994-11-01), DiMilia et al.
patent: 5484626 (1996-01-01), Storjohann et al.
patent: 5487981 (1996-01-01), Nivens et al.
Beck, Ralf et al. "Influence of the Surface Microbalance on the Coupling Between a Quartz Oscillator and a Liquid," in J. Electrochem. Soc., vol. 139, Feb. 1992, pp. 453-461.
Benje, Michael et al. "An Improved Quartz Microbalance: Applications to the Electrocrystallization and--dissolution of Nickel" in Ber. Bunsenges Phys. Chem., 90, VCH Verlagsgesellschaft mbH, 1986, pp. 435-439.
"Electrochemical Quartz Nanobalance," brochure by Elchema on the Model EQCN-500, Potsdam, NY.
"The Smart Plating and Etching Coupon System" brochure by Maxtek, Inc., Torrance, CA.

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