Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-05-02
1998-05-12
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430311, 430296, 430961, G03C 500, G03F 700
Patent
active
057503125
ABSTRACT:
It has been found that surface reactions with basic materials such as amines found in the processing environment during lithographic processing contribute to a loss of linewidth control for resists such as chemically amplified resists. This loss in linewidth results from the reaction of the acid generated by exposing radiation with, for example, the amine resulting in a lack of chemical reaction where such reaction is desired. The problem is solved in one embodiment by employing an acid containing barrier layer on the resist.
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Chandross Edwin Arthur
Nalamasu Omkaram
Reichmanis Elsa
Taylor Gary Newton
Thompson Larry Flack
Duda Kathleen
Lucent Technologies - Inc.
Schneider Bruce S.
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