X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1981-12-31
1983-10-04
Smith, Alfred E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378119, 378160, G03C 516
Patent
active
044083386
ABSTRACT:
A physical barrier is provided for debris discharged from any pulsed electromagnetic radiation source. A shutter is positioned in the path of the electromagnetic radiation at a distance sufficiently far from the source of the electromagnetic radiation such that an emitted pulse of electromagnetic radiation and the debris simultaneously discharged with the pulse become spatially separated from each other and arrive at the shutter at different times due to the inherent difference in propagation speed of the debris and pulse. Movement of the shutter is synchronized with generation of an electromagnetic pulse such that the electromagnetic pulse encounters an open shutter while the slower travelling debris simultaneously launched with the pulse encounters a closed shutter.
REFERENCES:
patent: 3991309 (1976-11-01), Hauer
patent: 4184078 (1980-01-01), Nagel et al.
patent: 4296330 (1981-10-01), Thomson et al.
Drumheller Ronald L.
Grigsby T. N.
International Business Machines - Corporation
Smith Alfred E.
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