Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1978-04-06
1980-04-08
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430496, 430627, 430913, G03C 168
Patent
active
041971302
ABSTRACT:
A novel photosensitive elastomeric composition comprising a thermoplastic elastomeric block copolymer, an ethylenically unsaturated compound derived from fumaric acid or maleic acid and a photopolymerization initiator. The composition of the present invention is excellent in various properties, especially in heat stability. The composition of the present invention is useful, especially for the manufacture of flexographic printing elements.
REFERENCES:
patent: 3031301 (1962-04-01), Agens
patent: 3265765 (1966-08-01), Holden et al.
patent: 3912516 (1975-10-01), Recchia et al.
patent: 3951657 (1976-04-01), Recchia et al.
Morotomi Kenichi
Nakamura Shohei
Asahi Kasei Kogyo Kabushiki Kaisha
Brammer Jack P.
LandOfFree
Photosensitive elastomeric composition and element does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive elastomeric composition and element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive elastomeric composition and element will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-972176