In situ deposition of a dielectric oxide layer and anti-reflecti

Details In situ deposition of a dielectric oxide layer and anti-reflecti In situ deposition of a dielectric oxide layer and anti-reflecti

1997-05-07

2000-12-05

Dixon, Merrick

Adhesive bonding and miscellaneous chemical manufacture

Methods

Surface bonding and/or assembly therefor

1562744, 1562726, 118705, 118708, 118712, 118722, 4272557, 427279, 438763, 438784, 438788, B32B 3100

Patent

active

061561495

ABSTRACT:
This invention provides a method and apparatus for depositing a two-layer structure, including an antireflective coating and a dielectric layer, without any intervening process steps, such as a cleaning step. The invention is capable of providing more accurate and easier fabrication of structures by reducing inaccuracies caused by the reflection and refraction of incident radiant energy within a photoresist layer used in the patterning of the dielectric layer. Additionally, the antireflective coating of the present invention may also serve as an etch stop layer during the patterning of a layer formed over the antireflective coating.

REFERENCES:
patent: 4998979 (1991-03-01), Nino
patent: 5261961 (1993-11-01), Takasu et al.
patent: 5443646 (1995-08-01), Yamada et al.
patent: 5661093 (1997-08-01), Raui et al.

Affiliated with

Also associated with

Rating

In situ deposition of a dielectric oxide layer and anti-reflecti does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with In situ deposition of a dielectric oxide layer and anti-reflecti, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and In situ deposition of a dielectric oxide layer and anti-reflecti will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-957763