Parallel-antenna transformer-coupled plasma generation system

Details Parallel-antenna transformer-coupled plasma generation system Parallel-antenna transformer-coupled plasma generation system

1998-03-31

2000-12-05

Kastler, Scott

Coating apparatus

Gas or vapor deposition

With treating means

118723R, 118723IR, C23C 1600

Patent

active

061551996

ABSTRACT:
Radio frequency plasma coupling systems allow for controllable, uniform inductive coupling within a plasma reactor, as well as separately controllable, uniform capacitive coupling within the reactor. According to exemplary embodiments, a set of parallel coupling elements are positioned on a dielectric window of a plasma chamber, and the positioning of the elements and/or a set of phase shifters situated between the elements are used to force the radio frequency current flowing within the elements to be oriented in a common direction. Consequently, the inductively coupled fields generated by the elements are reinforcing, and induce a highly uniform plasma in the reactor. Further, the electrical characteristics of the elements are such that independently controllable and highly uniform capacitive coupling can be provided in order to prevent polymer buildup on components within the reactor.

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