Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1981-12-16
1983-12-27
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430 5, G03C 506
Patent
active
044231270
ABSTRACT:
In the manufacture of a semiconductor device wherein a plurality of patterns are successively superimposed and printed on a semiconductor substrate, the invention offers a novel and useful method which includes (a) printing and forming on the semiconductor substrate a first pattern which includes a first alignment mark, (b) in forming a second pattern on the substrate, positioning and printing a second alignment mark contained in a second pattern relative to the first alignment mark on the substrate in such a manner that at least one part of the contour of the first mark is offset from that of the second mark, and is spaced a minute distance from it, and (c) in forming a third pattern on the substrate, positioning and printing a third alignment mark contained in a third pattern in such a manner that a part of the contour of the third alignment mark is offset from a part of the contour of the first alignment mark, and at least a part of the other portion of the contour of the third alignment mark is similarly offset from a part of the contour of the second alignment mark. The invention also offers marks for correctly positioning or registering masks formed by the abovedescribed steps.
REFERENCES:
patent: 3617267 (1971-11-01), Kinney
patent: 3783520 (1974-01-01), King
patent: 4309813 (1982-01-01), Hull
Dees Jos,e G.
Fujitsu Limited
Kittle John E.
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