X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1990-09-06

1992-06-23

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

378145, 2504922, G21K 504

Patent

active

051250144

ABSTRACT:
An exposure apparatus for exposing a substrate with X-rays is disclosed. The apparatus includes a radiation source for providing X-rays; and a convex mirror for reflecting the X-rays from the radiation source toward the substrate to expose a zone of the substrate with the X-rays; wherein the convex mirror and the substrate are so interrelated that a peak position of intensity distribution of the X-rays upon the zone deviates from the center of the zone.

REFERENCES:
patent: 4514857 (1985-04-01), Kimura et al.
patent: 4984259 (1991-01-01), Itou et al.
Patent Abstracts of Japan, Kokai No. 56-104438, vol. 5, No. 179, Nov. 1981.
Patent Abstracts of Japan, Kokai No. 60-7722, vol. 9, No. 118, May 1985.
Patent Abstracts of Japan, Kokai No. 60-226122, vol. 10, No. 79, Mar. 1986.
Haelbich, et al., "Design and Performance of an X-ray Lithography Beam Line at a Storage Ring," J. Vac. Sci. Technol. B1(4), Oct.-Dec. 1983, pp. 1262 through 1266.

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