Method for erosion detection of a sputtering target and target a

Details Method for erosion detection of a sputtering target and target a Method for erosion detection of a sputtering target and target a

1989-03-15

1991-01-08

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429803, C23C 1434

Patent

active

049832697

ABSTRACT:
A device to detect erosion of a target surface of sputtering sources in cathode sputtering layouts which has a target with at least one sensor at a predetermined position which is unchanged during the cathode sputtering process, directly detects the eroding of the target at a predetermined location. As a sensor measured quantity, photometric, electrical temperature, or pressure in the process chamber is used.

REFERENCES:
patent: 4140078 (1979-02-01), Wilmanns
patent: 4166783 (1979-09-01), Turner
patent: 4311725 (1982-01-01), Holland
patent: 4324631 (1982-04-01), Meckel et al.
patent: 4336119 (1982-06-01), Gillery
patent: 4407708 (1983-10-01), Landau

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