Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1994-03-15
1996-03-26
Loke, Steven H.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257301, 257329, 257330, H01L 27108, H01L 2976, H01L 2994, H01L 31062
Patent
active
055023207
ABSTRACT:
A semiconductor device comprising a semiconductor substrate of first conductivity type, a trench type element isolation region formed in a preset depth from the semiconductor substrate surface, an element region of the first conductivity type surrounded by the element isolation region, a gate trench for forming a gate electrode, the trench being formed in the semiconductor substrate with a smaller depth than the element isolation region and extending through the element region and element isolation region, a gate electrode buried in the bottom portion of the gate trench via a gate insulation film, and source and drain regions of a second conductivity type formed in the element region and separated from each other by the gate trench, wherein the top surface of the gate electrode lies higher than the bottom levels of the source and drain regions and lower than a contact surface of the source and drain regions.
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Kabushiki Kaisha Toshiba
Loke Steven H.
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