Method of and apparatus for minimizing plasma instability in an

Details Method of and apparatus for minimizing plasma instability in an Method of and apparatus for minimizing plasma instability in an

1998-01-09

1999-07-27

Gensler, Paul

Wave transmission lines and networks

Automatically controlled systems

Impedance matching

31511121, 364482, H03H 740

Patent

active

059297174

ABSTRACT:
Variable reactances of a matching network connected between an r.f. source and a plasma load of a vacuum plasma chamber processing a workpiece are varied so a tendency of the plasma to change in an unstable manner which can adversely affect processing of the workpiece is avoided while matching is approached. The plasma tendency to change in an unstable manner is detected by monitoring an electrical parameter resulting from r.f. current flowing between the source and load via the network. The parameter can be (1) statistically based, e.g. variance of percent delivered power, or (2) amplitude modulation in one or both of the 2-20 kHz and 50-200 kHz ranges.

REFERENCES:
patent: 5689215 (1997-11-01), Richardson et al.
patent: 5793162 (1998-08-01), Barnes et al.
patent: 5815047 (1998-09-01), Sorensen et al.
patent: 5842154 (1998-11-01), Harnett

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