Plasma removal of unwanted material

Details Plasma removal of unwanted material Plasma removal of unwanted material

1989-09-08

1990-12-04

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 134 2, 134 26, 156646, 156656, 156655, 20419235, B44C 122, C23F 100, C03C 1500, C03C 2506

Patent

active

049751468

ABSTRACT:
A method fpr removing coatings from surfaces without damaging the underlying surface includes placing a surface having material to be removed thereon into a plasma reactor and exposing it to a gaseous plasma comprising a reactive halogen species. The reactive halogen species may be derived from one or more of many well known halogen gases. An optional step of cleaning the coating prior to exposure to the halogen plasma is recommended.

REFERENCES:
patent: Re30505 (1981-02-01), Jacob
patent: 4657616 (1987-04-01), Benzing et al.
patent: 4676866 (1987-06-01), Tang et al.
patent: 4764248 (1988-08-01), Bhattacherjee et al.
patent: 4786352 (1988-11-01), Benzing
patent: 4832787 (1989-05-01), Bondur et al.
patent: 4857140 (1989-08-01), Boewenstein
patent: 4877482 (1989-10-01), Knapp et al.
patent: 4878994 (1989-11-01), Jucha

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